DocumentCode
1002194
Title
Patterning effect on easy axis alignment in permalloy thin film
Author
Shiroishi, Y. ; Shiiki, K. ; Yuitoo, I. ; Tanabe, H. ; Fujiwara, H. ; Kudo, M.
Author_Institution
Hitachi, Ltd., Kokubunji, Tokyo, Japan
Volume
20
Issue
3
fYear
1984
fDate
5/1/1984 12:00:00 AM
Firstpage
485
Lastpage
488
Abstract
An investigation has been made of the domain configuration in photofabricated Permalloy patterns. In some cases the direction of the easy axis is found to be rotated perpendicular to that initially induced. This change can be explained in terms of uniaxial tension simulated by a two-dimensional finite-element method.
Keywords
Permalloy films/devices; Glass; Laboratories; Magnetic anisotropy; Magnetic films; Perpendicular magnetic anisotropy; Residual stresses; Substrates; Thermal stresses; Thin film devices; Transistors;
fLanguage
English
Journal_Title
Magnetics, IEEE Transactions on
Publisher
ieee
ISSN
0018-9464
Type
jour
DOI
10.1109/TMAG.1984.1063116
Filename
1063116
Link To Document