• DocumentCode
    1009880
  • Title

    Simplified analysis of body-contact effect for MOSFET/SOI

  • Author

    Omura, Yasuhisa ; Izumi, Katsutoshi

  • Author_Institution
    LSI Lab., NTT, Kanagawa, Japan
  • Volume
    35
  • Issue
    8
  • fYear
    1988
  • fDate
    8/1/1988 12:00:00 AM
  • Firstpage
    1391
  • Lastpage
    1393
  • Abstract
    A simplified experimental analysis of the body-contact effect and its impact on drain current reduction is carried out to clarify the relevant parameters for MOSFET/SOI design. In the experiments, body contacts in the source are distributed in a mosaic configuration. The empirical relationship between drain current and the number of body contacts is obtained. The relationship suggests that there must be a sufficient number of body contacts to suppress the kink effect to avoid reduction in drain current
  • Keywords
    field effect integrated circuits; insulated gate field effect transistors; MOSFET/SOI; Si; body-contact effect; drain current reduction; mosaic configuration; Aluminum; Annealing; Atomic layer deposition; Bipolar transistors; Boron; Impurities; Large scale integration; MOSFET circuits; Semiconductor films; Silicon on insulator technology;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/16.2567
  • Filename
    2567