• DocumentCode
    1016169
  • Title

    On the Interpretation of Local Negative Mobilities in Nanoscale Semiconductor Devices

  • Author

    Brugger, Simon C. ; Schenk, Andreas

  • Author_Institution
    ETH Zurich, Zurich
  • Volume
    54
  • Issue
    7
  • fYear
    2007
  • fDate
    7/1/2007 12:00:00 AM
  • Firstpage
    1766
  • Lastpage
    1770
  • Abstract
    In a previous theoretical work, the concept of mobility has been unequivocally extended to inhomogeneous nonequilibrium systems. This generalization naturally suggests a new one-particle Monte Carlo method to solve the Boltzmann equation, which can self-consistently take into account generation-recombination processes, as well as quantum corrections. This new scheme has been successfully applied to different kinds of MOSFETs. The results of the simulations clearly show that, surprisingly, the mobility in the channel can become negative. In this brief, we present a detailed analysis of this phenomenon and show that negative mobilities are directly related to regions, where quasi-ballistic transport takes place.
  • Keywords
    Boltzmann equation; MOSFET; Monte Carlo methods; Boltzmann equation; MOSFET; Monte Carlo method; channel mobility; generation-recombination processes; inhomogeneous nonequilibrium systems; local negative mobilities; nanoscale semiconductor devices; quantum corrections; quasiballistic transport; Boltzmann equation; Current density; Distribution functions; Electrons; Inverse problems; MOSFETs; Nanoscale devices; Radiative recombination; Scattering; Semiconductor devices; Boltzmann equation (BE); inverse scattering operator (ISO); negative mobility; quasi-ballistic transport;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/TED.2007.898241
  • Filename
    4252357