DocumentCode
1018186
Title
Rotational, vibrational, and excitation temperatures of a microwave-frequency microplasma
Author
Iza, Felipe ; Hopwood, Jeffrey A.
Author_Institution
Electr. & Comput. Eng. Dept., Northeastern Univ., Boston, MA, USA
Volume
32
Issue
2
fYear
2004
fDate
4/1/2004 12:00:00 AM
Firstpage
498
Lastpage
504
Abstract
Integration of microplasma sources in portable systems sets constraints in the amount of power and vacuum levels employed in these plasma sources. Moreover, in order to achieve good power efficiency and prevent physical deterioration of the source, it is desirable to keep the discharge temperature low. In this paper, the thermal characteristics of an atmospheric argon discharge generated with a low-power microwave plasma source are investigated to determine its possible integration in portable systems. The source is based on a microstrip split-ring resonator and is similar to the one reported by Iza and Hopwood, 2003. Rotational, vibrational, and excitation temperatures are measured by means of optical emission spectroscopy. It is found that the discharge at atmospheric pressure presents a rotational temperature of ∼300 K, while the excitation temperature is ∼0.3 eV (∼3500 K). Therefore, the discharge is clearly not in thermal equilibrium. The low rotational temperature allows for efficient air-cooled operation and makes this device suitable for portable applications including those with tight thermal specifications such as treatment of biological materials.
Keywords
argon; high-frequency discharges; plasma diagnostics; plasma sources; plasma temperature; plasma thermodynamics; 1 atm; air-cooled operation; atmospheric argon discharge; discharge temperature; excitation temperature; microplasma sources; microstrip split-ring resonator; microwave-frequency microplasma; optical emission spectroscopy; rotational temperature; vibrational temperature; Argon; Character generation; Fault location; Microwave generation; Optical resonators; Plasma sources; Plasma temperature; Temperature measurement; Vacuum systems; Vibration measurement; Excitation temperature; microplasma; microwave plasma; rotational temperature; split-ring resonator; vibrational temperature;
fLanguage
English
Journal_Title
Plasma Science, IEEE Transactions on
Publisher
ieee
ISSN
0093-3813
Type
jour
DOI
10.1109/TPS.2004.826145
Filename
1308498
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