DocumentCode
1022104
Title
Silicon planar epitaxial transistors as fast and reliable low-level switches
Author
Verster, T.C.
Author_Institution
National Research Institute for Mathematical Sciences, Pretoria, South Africa
Volume
11
Issue
5
fYear
1964
fDate
5/1/1964 12:00:00 AM
Firstpage
228
Lastpage
237
Abstract
This paper attempts to accentuate all the salient factors of high-quality switches, such as their static properties, stability under various conditions of high temperature or thermal cycling, and some aspects of their transient response. It is shown that the silicon planar epitaxial transistor possesses the most advantageous combination of properites for general application as a low-level switch, and that simple low-injection level formulas are sufficiently accurate for the calculation of voltage offset and resistance of an "on" switch, as well as the "off" resistance, if extrinsic parameters and current dependence of βn and βi are taken into account. A simplified procedure is proposed for the selection of temperature-compensated switch pairs. Hysteresis in a single parameter βn is shown to be the main cause of instability in voltage offset in germanium alloy-type transistors, an effect which is hardly detectable in silicon planar epitaxial devices. Suitability of the latter for fast operation in chopper amplifiers is discussed, and their capabilities in a rapid-sampling commutator is illustrated.
Keywords
Germanium alloys; Germanium silicon alloys; Hysteresis; Silicon germanium; Switches; Temperature; Thermal factors; Thermal stability; Transient response; Voltage;
fLanguage
English
Journal_Title
Electron Devices, IEEE Transactions on
Publisher
ieee
ISSN
0018-9383
Type
jour
DOI
10.1109/T-ED.1964.15317
Filename
1473705
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