• DocumentCode
    1022171
  • Title

    Oxygen influence on drawing-induced defect centres and radiation-induced loss in pure silica optical fibres

  • Author

    Hibino, Y. ; Hanafusa, H. ; Yamamoto, Fumihiko

  • Author_Institution
    NTT Electrical Communications Laboratories, Tokai, Japan
  • Volume
    22
  • Issue
    8
  • fYear
    1986
  • Firstpage
    434
  • Lastpage
    435
  • Abstract
    Drawing-induced defect centres are investigated in pure silica optical fibres drawn from the preforms consolidated in O2-including atmospheres. The drawing-induced E¿ centres decrease while the peroxy radicals increase with increasing flow rate of O2 into the consolidation furnance. The ¿-ray-induced loss of these fibres is also examined.
  • Keywords
    defect electron energy states; drawing (mechanical); gamma-ray effects; optical fibres; optical losses; paramagnetic resonance of defects; silicon compounds; E´ centres; ESR; O2; SiO2 optical fibres; drawing-induced defect centres; peroxy radicals; radiation-induced loss; ¿-ray-induced loss;
  • fLanguage
    English
  • Journal_Title
    Electronics Letters
  • Publisher
    iet
  • ISSN
    0013-5194
  • Type

    jour

  • DOI
    10.1049/el:19860296
  • Filename
    4256489
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=1022171