DocumentCode
1028211
Title
Double heterojunction bipolar transistors using AlGaInP/GaAs/GaInP
Author
Yow, H.K. ; Lee, Tae-Woo ; Houston, P.A. ; Lee, H.Y. ; Button, C.C. ; Roberts, Jeffrey S.
Author_Institution
Dept. of Electron. & Electr. Eng., Sheffield Univ., UK
Volume
30
Issue
2
fYear
1994
fDate
1/20/1994 12:00:00 AM
Firstpage
167
Lastpage
169
Abstract
The first Al0.18Ga0.34In0.48P/GaAs/Ga0.52In0.43P double heterojunction bipolar transistors grown by metal organic vapour phase epitaxy are reported. They exhibit a current gain of 110 at high collector-emitter voltage and a small offset voltage of 30 mV. The addition of Al to the emitter has not adversely affected the quality of the emitter-base interface.
Keywords
III-V semiconductors; aluminium compounds; gallium arsenide; gallium compounds; heterojunction bipolar transistors; indium compounds; semiconductor epitaxial layers; semiconductor growth; vapour phase epitaxial growth; 30 mV; AlGaInP-GaAs-GaInP; AlGaInP/GaAs/GaInP structure; III-V semiconductors; collector-emitter voltage; current gain; double heterojunction bipolar transistors; emitter-base interface; metal organic vapour phase epitaxy; offset voltage;
fLanguage
English
Journal_Title
Electronics Letters
Publisher
iet
ISSN
0013-5194
Type
jour
DOI
10.1049/el:19940092
Filename
265322
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