• DocumentCode
    1031013
  • Title

    Wavelength dependence of optical oxidation of silicon

  • Author

    Boyd, I.W. ; Micheli, F.

  • Author_Institution
    University College London, Department of Electronic & Electrical Engineering, London, UK
  • Volume
    23
  • Issue
    6
  • fYear
    1987
  • Firstpage
    298
  • Lastpage
    300
  • Abstract
    Using a novel technique to amplify small increases in the oxidation rate of laser-irradiated silicon, we have successfully isolated a photonic contribution to the reaction induced by CW argon laser radiation.
  • Keywords
    laser beam applications; laser beam effects; oxidation; semiconductor technology; silicon; Ar laser; CW Ar laser radiation; Si oxidation; laser enhanced oxidation of Si; oxidation rate; photonic contribution; wavelength dependence;
  • fLanguage
    English
  • Journal_Title
    Electronics Letters
  • Publisher
    iet
  • ISSN
    0013-5194
  • Type

    jour

  • DOI
    10.1049/el:19870217
  • Filename
    4257544
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=1031013