• DocumentCode
    1033518
  • Title

    Ferrite plating of Fe3O4 and Fe3-xNixO4 films at 100-200°C

  • Author

    Itoh, Takayuki ; Abe, Makoto ; Sasao, T. ; Tamaura, Y.

  • Author_Institution
    Dept. of Phys. Electron., Tokyo Inst. of Technol.
  • Volume
    25
  • Issue
    5
  • fYear
    1989
  • fDate
    9/1/1989 12:00:00 AM
  • Firstpage
    4230
  • Lastpage
    4232
  • Abstract
    Ferrite plating of Fe3-xNixO4 ( x=0-0.93) films in the temperature region T=120°C-200°C and in the pressure region P=15-20 kg/cm2 was performed. A reaction solution and an oxidizing solution were supplied to a reaction cell by high-pressure pumps. A phase diagram for an iron oxide film was obtained for T=120°C-180°C and pH=4.0-7.6. Single-phase Fe3 O4 (x=0) film grows only at T=180°C and pH=6.0-7.6, with the α-Fe2O3 phase appearing outside the region. The solubility limit of Ni increases as the plating temperature increases, from x=~0.3 at 80°C to x=0.93 at 200°C. All the films are polycrystalline with no preferential orientation, and the magnetization exhibits no definite anisotropy. The grain size of the films increases as x increases, reaching ~1 μm at x=0.86
  • Keywords
    electroless deposition; ferrimagnetic properties of substances; ferrites; magnetic thin films; 1 micron; 100 to 200 C; 15 to 20 kgf/cm2; Fe3-xNixO4; Fe3O4; ferrite plating; grain size; high-pressure pumps; magnetization; oxidizing solution; phase diagram; plating temperature; reaction cell; reaction solution; Conductivity; Data mining; Equations; Ferrite films; Frequency dependence; Iron; Magnetics; Mathematical model; Polynomials; Proposals;
  • fLanguage
    English
  • Journal_Title
    Magnetics, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9464
  • Type

    jour

  • DOI
    10.1109/20.42578
  • Filename
    42578