• DocumentCode
    1034351
  • Title

    Current gain and cutoff frequency falloff at high currents

  • Author

    Whittier, R.J. ; Tremere, D.A.

  • Author_Institution
    Fairchild Semiconductor Research, Palo Alto, Calif.
  • Volume
    16
  • Issue
    1
  • fYear
    1969
  • fDate
    1/1/1969 12:00:00 AM
  • Firstpage
    39
  • Lastpage
    57
  • Abstract
    A theoretical and experimental study of the effects of high-level injection of carriers into a reverse-biased collector-base junction has been performed. Two models which describe the high-current behavior of the junction space-charge region are discussed. The first deals with the formation of a current-induced base region at space-charge-limited current densities. The second model assumes that two-dimensional effects are predominant; at current densities corresponding to the onset of space-charge-limited current, lateral injection of carriers takes place. These phenomena were studied experimentally using silicon double-diffused transistor structures. The existence of space-charge-limited current in the reverse-biased collector depletion layer manifests itself in significant changes in the ac and dc parameters of the transistor. In particular, it is shown that the cutoff frequency (fT) and large-signal current gain (hFE) begin to decrease rapidly with increasing current at the onset of the space-charge limitation. A comparison of experimental results with predictions of the above theories indicates that, while both the formation of a current-induced base region and lateral injection do take place, the latter mechanism controls conventional device performance.
  • Keywords
    Critical current; Current density; Cutoff frequency; Electrons; Frequency response; Helium; Iron; P-n junctions; Performance gain; Silicon;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/T-ED.1969.16564
  • Filename
    1475607