Monolithic integration of wavelength-scale diffractive structures on red vertical-cavity lasers by focused ion beam etching

Author

Justice, J.P. ; Lambkin, P. ; Meister, M. ; Winfield, R. ; Corbett, B.

Author_Institution

Nat. Microelectron. Res. Centre, Cork, Ireland

Volume

16

Issue

8

fYear

2004

Firstpage

1795

Lastpage

1797

Abstract

We report the fabrication and characterization of wavelength-scale diffractive optical elements etched directly on the surface of red (660 nm) vertical-cavity surface-emitting lasers. The structures were fabricated by focused ion beam etching. Linear and two-dimensional (2-D) grating configurations were investigated. Each showed excellent suppression of the zeroth-order diffracted beam. Compared to the power from an unetched laser, ∼22% of the emission was coupled into the first order for linear gratings and 12% for the 2-D structures. Polarization was independent of grating orientation for grating pitches as small as 1λ. Threshold current increases of 35%-40% were measured.

Keywords

diffraction gratings; diffractive optical elements; integrated optics; integrated optoelectronics; ion beam effects; laser cavity resonators; optical fabrication; optical testing; quantum well lasers; sputter etching; surface emitting lasers; 660 nm; diffractive optical elements; focused ion beam etching; linear grating configuration; monolithic integration; optical characterization; optical fabrication; polarization; red vertical-cavity lasers; two-dimensional grating configuration; wavelength-scale diffractive structures; zeroth-order diffracted beam; Etching; Gratings; Ion beams; Monolithic integrated circuits; Optical device fabrication; Optical diffraction; Optical surface waves; Surface emitting lasers; Surface waves; Vertical cavity surface emitting lasers;

fLanguage

English

Journal_Title

Photonics Technology Letters, IEEE

Publisher

ieee

ISSN

1041-1135

Type

jour

DOI

10.1109/LPT.2004.831059

Filename

1316926