Electron fly´s eye lens artwork camera

The design of an electron beam artwork camera that records integrated-circuit patterns directly from computer circuit, design programs is discussed. The system produces artwork patterns covering a 1- by 1-in area with line edge definition of 0.5 µm and with capability for producing patterns at 3, 5, or 10 times scale. The electron beam pattern-recording is achieved through the use of a novel electron optical element-the electron fly´s eye lens-an array of small electron lenses, each with its own deflection system. The complete pattern is recorded by electronic control of the electron beam, hence no mechanical motion. The patterns are recorded faster than possible with mechanically stepped photo-optical artwork systems. Pattern-to-pattern registration is insured by the use of the fly´s eye lens and computer control to the deflection voltages.