• DocumentCode
    1049714
  • Title

    Charge-coupled structures with self-aligned submicron gaps

  • Author

    Haken, Roger A. ; Beynon, John D E ; Baker, Ian M. ; Roberts, Peter C T

  • Author_Institution
    University of Southampton, Southampton, England
  • Volume
    22
  • Issue
    5
  • fYear
    1975
  • fDate
    5/1/1975 12:00:00 AM
  • Firstpage
    289
  • Lastpage
    293
  • Abstract
    A technique for fabricating charge-coupled devices with submicron gaps is described. The method relies on a "shadowing" effect produced by oblique deposition of the metal in an otherwise standard vacuum evaporation process. The biggest advantage of the technique is its extreme simplicity, particularly for one-dimensional CCD structures. The feasibility of the technique has been demonstrated for two-and three-phase devices; the two-phase structure was a 32-bit shift register which has been operated at up to 10 MHz. With some additional processing, the technique can be used to make bidirectional CCD arrays as required in area imagers and serpentine shift registers.
  • Keywords
    Aluminum; Charge coupled devices; Electrodes; Etching; Fabrication; Metallization; Shadow mapping; Shift registers; Silicon; Temperature;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/T-ED.1975.18120
  • Filename
    1477955