Projection printed photolithographic images in positive photoresists

For a study of the profiles and linewidths of developed photoresist images, photolithographic images in a positive photoresist were obtained by projection printing methods. Also, profiles of the developed images were simulated with an algorithm that computes the optical image intensity distribution appropriate to the projection system, the dynamic exposure response of the resist to the imagery, and the development response of the resist to the developer. Comparisons of experimental profiles and linewidths with simulated ones show good agreement. Thus we deduce that the physics of the model of the overall system contained in the algorithm is a valid description of the system.