• DocumentCode
    1050382
  • Title

    High injection in narrow uniform p-n junctions: A second-approximation model

  • Author

    Boccassi, Giuseppe ; Capocaccia, Fabip

  • Author_Institution
    Ansaldo, Automation Department, Genoa, Itally
  • Volume
    22
  • Issue
    8
  • fYear
    1975
  • fDate
    8/1/1975 12:00:00 AM
  • Firstpage
    602
  • Lastpage
    609
  • Abstract
    The classical first-approximation high-injection theory in narrow uniform p-n junctions is based on two restrictive assumptions: negligible majority carrier current in the less-doped region (the theory applies to one-sided junctions only) and quasi-neutrality outside the space-charge layer. It has been shown in the literature that, in order to remove both assumptions, numerical integration methods are required. A second-approximation model is proposed in this paper, in which only the first of the two assumptions is removed. This model approaches the accuracy of the exact numerical solution, while still retaining all the advantages of the classical theory, i.e., the availability of analytical solutions and a better physical understanding of the high-injection phenomenon. Furthermore, the proposed model is not restricted to one-sided junctions only.
  • Keywords
    Charge carrier processes; Current density; Differential equations; Diodes; Electrostatics; Numerical models; P-n junctions; Silicon; Temperature; Voltage;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/T-ED.1975.18184
  • Filename
    1478019