DocumentCode
1050382
Title
High injection in narrow uniform p-n junctions: A second-approximation model
Author
Boccassi, Giuseppe ; Capocaccia, Fabip
Author_Institution
Ansaldo, Automation Department, Genoa, Itally
Volume
22
Issue
8
fYear
1975
fDate
8/1/1975 12:00:00 AM
Firstpage
602
Lastpage
609
Abstract
The classical first-approximation high-injection theory in narrow uniform p-n junctions is based on two restrictive assumptions: negligible majority carrier current in the less-doped region (the theory applies to one-sided junctions only) and quasi-neutrality outside the space-charge layer. It has been shown in the literature that, in order to remove both assumptions, numerical integration methods are required. A second-approximation model is proposed in this paper, in which only the first of the two assumptions is removed. This model approaches the accuracy of the exact numerical solution, while still retaining all the advantages of the classical theory, i.e., the availability of analytical solutions and a better physical understanding of the high-injection phenomenon. Furthermore, the proposed model is not restricted to one-sided junctions only.
Keywords
Charge carrier processes; Current density; Differential equations; Diodes; Electrostatics; Numerical models; P-n junctions; Silicon; Temperature; Voltage;
fLanguage
English
Journal_Title
Electron Devices, IEEE Transactions on
Publisher
ieee
ISSN
0018-9383
Type
jour
DOI
10.1109/T-ED.1975.18184
Filename
1478019
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