• DocumentCode
    1052441
  • Title

    Scaling of surface-channel charge-coupled devices

  • Author

    Yau, Leopoldo D.

  • Author_Institution
    Bell Laboratories, Murray Hill, NJ
  • Volume
    23
  • Issue
    2
  • fYear
    1976
  • fDate
    2/1/1976 12:00:00 AM
  • Firstpage
    282
  • Lastpage
    287
  • Abstract
    Improvement in lithographic resolution will enable designers to reduce the area of charge-coupled device (CCD) memories. However, if only lateral dimensions are scaled down, the transfer inefficiency will increase. The transfer inefficiency is determined primarily by surface states or by barrier-modulation effects. A scaling procedure is described which will allow transfer inefficiency to be unchanged as the cell size is reduced by scaling other CCD parameters such that the normalized potential distribution under the gates is maintained. The normalized potential distribution can be maintained in two ways: 1) constant gate voltage scaling, which has the advantage of better S/N (because higher charges are handled) but is limited by electrical breakdown and 2) constant field scaling which avoids this limit but has a poorer S/N. A sample calculation shows that signal deterioration at smaller cell sizes is still dominated by the transfer-inefficiency effects rather than the noise effects.
  • Keywords
    Breakdown voltage; Charge coupled devices; Conductors; Electric breakdown; Electrodes; Electron beams; Fabrication; Helium; Lithography; Semiconductor device noise;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/T-ED.1976.18387
  • Filename
    1478401