DocumentCode
1052441
Title
Scaling of surface-channel charge-coupled devices
Author
Yau, Leopoldo D.
Author_Institution
Bell Laboratories, Murray Hill, NJ
Volume
23
Issue
2
fYear
1976
fDate
2/1/1976 12:00:00 AM
Firstpage
282
Lastpage
287
Abstract
Improvement in lithographic resolution will enable designers to reduce the area of charge-coupled device (CCD) memories. However, if only lateral dimensions are scaled down, the transfer inefficiency will increase. The transfer inefficiency is determined primarily by surface states or by barrier-modulation effects. A scaling procedure is described which will allow transfer inefficiency to be unchanged as the cell size is reduced by scaling other CCD parameters such that the normalized potential distribution under the gates is maintained. The normalized potential distribution can be maintained in two ways: 1) constant gate voltage scaling, which has the advantage of better S/N (because higher charges are handled) but is limited by electrical breakdown and 2) constant field scaling which avoids this limit but has a poorer S/N. A sample calculation shows that signal deterioration at smaller cell sizes is still dominated by the transfer-inefficiency effects rather than the noise effects.
Keywords
Breakdown voltage; Charge coupled devices; Conductors; Electric breakdown; Electrodes; Electron beams; Fabrication; Helium; Lithography; Semiconductor device noise;
fLanguage
English
Journal_Title
Electron Devices, IEEE Transactions on
Publisher
ieee
ISSN
0018-9383
Type
jour
DOI
10.1109/T-ED.1976.18387
Filename
1478401
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