• DocumentCode
    1052619
  • Title

    Consideration of feed-through voltage in amorphous-Si TFT´s

  • Author

    Takabatake, Masaru ; Tsumura, Makoto ; Nagae, Yoshiharu

  • Author_Institution
    Hitachi Ltd., Ibaraki, Japan
  • Volume
    40
  • Issue
    10
  • fYear
    1993
  • fDate
    10/1/1993 12:00:00 AM
  • Firstpage
    1866
  • Lastpage
    1870
  • Abstract
    Feedthrough voltage is an important factor in designing integrated data drive circuits and display area in thin-film-transistor liquid-crystal displays (TFT LCDs). With respect to feedthrough voltage, only the gate-source overlay capacitance has been considered in amorphous-Si (a-Si) TFTs, because of their staggered structure with overlap area. It is pointed out that, in a-Si TFTs designed as active elements, feedthrough voltage is mainly due to the carrier redistribution. The main reason is that, since the field-effect mobility is low (W/L>1), the leakage current must be kept low (L⩾10 μm), and an active layer is inserted in the overlap area (unlike the case with MOS device structures), the area of the active layer is large. Taking the carrier redistribution into account, the maximum difference between the voltage obtained using the modified model and the experimental voltage is within 20%. By comparison, the results obtained using the previous model for TFTs are approximately three times smaller than the experimental results
  • Keywords
    amorphous semiconductors; capacitance; carrier mobility; elemental semiconductors; insulated gate field effect transistors; leakage currents; liquid crystal displays; semiconductor device models; silicon; thin film transistors; TFT; active layer; amorphous Si; carrier redistribution; feed-through voltage; feedthrough voltage; field-effect mobility; gate-source overlay capacitance; integrated data drive circuits; leakage current; liquid-crystal displays; modified model; overlap area; staggered structure; thin-film-transistor; Amorphous materials; Capacitance; Circuits; Constitution; Displays; Drives; Leakage current; MOS devices; Thin film transistors; Voltage;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/16.277346
  • Filename
    277346