DocumentCode
1054374
Title
Electron cyclotron wave propagation, absorption, and backscatter measurements in a laboratory plasma
Author
Scharer, John E. ; Eldridge, Owen C. ; Chang, Sheng-Fuh R. ; Zhang, Yong-Shan ; Bettenhausen, Michael H. ; Lam, Nguyen T.
Author_Institution
Wisconsin Univ., Madison, WI, USA
Volume
21
Issue
3
fYear
1993
fDate
6/1/1993 12:00:00 AM
Firstpage
271
Lastpage
281
Abstract
Broadband microwave propagation and absorption processes and backscatter from objects immersed in a magnetized, finite, warm plasma column is addressed. In particular, the propagation, absorption, and backscatter of electron cyclotron waves are measured and compared with bounded vacuum hot plasma wave propagation, absorption, and ray tracing theory. The nonreciprocal nature of the transmission and absorption in an anisotropic plasma is measured. A homodyne technique which isolates the scattering from a single object in the plasma from the scattering from all other objects in the plasma and the walls of the containment device is developed and utilized. The range of absorption frequencies and nonreciprocity of the transmission signal are shown to be well correlated with wave trajectories in the associated regions of the Clemmow-Mullaly-Allis (CMA) diagram. It is shown that quasi-parallel propagation of electron cyclotron waves near resonance is present and that the transverse effects of wavenumber on propagation in the cylindrical plasma are small
Keywords
antennas in plasma; backscatter; electromagnetic wave propagation in plasma; plasma diagnostics; Clemmow-Mullaly-Allis diagram; absorption processes; anisotropic plasma; backscatter measurements; bounded vacuum hot plasma wave propagation; containment device; cylindrical plasma; electron cyclotron wave propagation; homodyne technique; laboratory plasma; microwave propagation; quasi-parallel propagation; ray tracing theory; transmission; transverse effects; warm plasma column; wave trajectories; Backscatter; Cyclotrons; Electromagnetic heating; Electromagnetic wave absorption; Electrons; Microwave propagation; Plasma devices; Plasma measurements; Plasma waves; Scattering;
fLanguage
English
Journal_Title
Plasma Science, IEEE Transactions on
Publisher
ieee
ISSN
0093-3813
Type
jour
DOI
10.1109/27.277552
Filename
277552
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