DocumentCode
1056522
Title
Microfabrication of high-frequency vacuum electron devices
Author
Ives, R.Lawrence
Author_Institution
Calabasas Creek Res. Inc., Saratoga, CA, USA
Volume
32
Issue
3
fYear
2004
fDate
6/1/2004 12:00:00 AM
Firstpage
1277
Lastpage
1291
Abstract
Advances in manufacturing technology for microstructures are allowing new opportunities for vacuum electron devices producing radio-frequency (RF) radiation. Specifically, the capability to produce small circuit structures is allowing development of RF devices at frequencies impractical with traditional machining technology. This is generating increased interest in applications in the submillimeter and terahertz frequency range. High-power RF devices in this frequency range are needed for medical, communications, defense, and homeland security applications. This paper describes the most promising microfabrication techniques applicable to high-frequency RF devices and examples of recent applications.
Keywords
electron device manufacture; submillimetre wave devices; high-frequency vacuum electron devices; high-power RF devices; manufacturing technology; microfabrication techniques; small circuit structures; submillimeter frequency; terahertz frequency; Chemicals; Electron devices; Electron mobility; Field emitter arrays; Machining; Production; Radio frequency; Spectroscopy; Submillimeter wave technology; Vacuum technology; BWO; Backward wave oscillator; DRIE; EDM; FEA; FIB; LIGA; RF source; SU-; cold cathode; deep reactive ion etching; electrical discharge machining; field emission; field emitter array; focused ion beam; radiation; spectroscopy;
fLanguage
English
Journal_Title
Plasma Science, IEEE Transactions on
Publisher
ieee
ISSN
0093-3813
Type
jour
DOI
10.1109/TPS.2004.827595
Filename
1321291
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