• DocumentCode
    1058673
  • Title

    Two-region computational model for DC glow discharge plasma

  • Author

    Pirooz, Saeed ; Ramachandran, Palghat A. ; Abraham-Shrauner, Barbara

  • Author_Institution
    MEMC Electron. Mater. Inc., St. Peters, MO, USA
  • Volume
    19
  • Issue
    2
  • fYear
    1991
  • fDate
    4/1/1991 12:00:00 AM
  • Firstpage
    408
  • Lastpage
    418
  • Abstract
    A two-region model has been developed which simplifies the computations for a DC glow discharge plasma between two parallel plates. The glow discharge is divided into a cathode sheath and a bulk plasma. An anode sheath is ignored in the computations. The bulk plasma is assumed to be quasi-neutral and supports ambipolar diffusion. To link the sheath and bulk regions, the classical ambipolar analysis is modified to include a net total current in the plasma. In the sheath region the plasma variables are determined by numerical integration of an initial-value problem by Gear´s routine. The integration starts from the cathode with the total current fixed and with the cathode electric field iterated until a complete solution is found. The sheath-bulk boundary occurs at the distance from the cathode where the electron and ion densities are nearly equal; matching conditions on the plasma variables are imposed here. Illustrative results are presented for some chosen conditions, and the effect of operating variables on the pertinent plasma properties is qualitatively discussed
  • Keywords
    glow discharges; DC glow discharge plasma; Gear´s routine; ambipolar diffusion; bulk plasma; cathode electric field; cathode sheath; initial-value problem; integration; parallel plates; sheath-bulk boundary; two-region computational model; Cathodes; Chemical engineering; Computational modeling; Glow discharges; Plasma applications; Plasma chemistry; Plasma materials processing; Plasma properties; Plasma sheaths; Sputter etching;
  • fLanguage
    English
  • Journal_Title
    Plasma Science, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0093-3813
  • Type

    jour

  • DOI
    10.1109/27.106839
  • Filename
    106839