Two-dimensional profile of emissive species in a magnetized SiH4/Ar glow discharge for the scanning-plasma CVD method

In order to control reactive glow discharge plasmas, the authors have investigated a crossed magnetic field B perpendicular to the discharge electric field E. It was found that profiles of SiH* emission, had two peaks in both the negative glow region and the cathode sheath region. As a result of the modification of the plasma structure by the crossed magnetic field, subsequent modification of spatial profiles of optical emission from SiH and Ar were observed. The H_α emission in the cathode sheath region, were not much influenced by the crossed magnetic field. By applying a modulated magnetic field in AC discharge plasmas (scanning plasma method), time-averaged uniform profiles of both plasmas and SiH radicals could be realized near the substrate sustained outside the discharge region. The minimum inhomogeneities of both profiles were less than 2.5% for the magnetic flux density of several tenths of a gauss, in contrast with 15% for the condition of no magnetic field