DocumentCode
1060694
Title
Development of 3-D Stack Package Using Silicon Interposer for High-Power Application
Author
Khan, Navas ; Yoon, Seung Wook ; Viswanath, Akella G K ; Ganesh, V.P. ; Nagarajan, Ranganathan ; Witarsa, David ; Lim, Samuel ; Vaidyanathan, Kripesh
Author_Institution
Inst. of Microelectron., Singapore
Volume
31
Issue
1
fYear
2008
Firstpage
44
Lastpage
50
Abstract
Stacking of many functional chips in a 3-D stack package leads to high heat dissipation. Therefore, a new platform technology is required to assemble chips vertically and remove the heat effectively. A 3-D stacked package with silicon interposers was developed to integrate one ASIC and two memory chips in a package. Electrical connections in the silicon interposer were formed by through silicon via. Silicon interposer has much high thermal conductivity than organic interposer, therefore the package thermal resistance is lower. Thermal performances of the 3-D package were analyzed and thermal enhancements like thermal via, thermal bridging were evaluated. The designed package showed 5 times lesser thermal resistance compared to a similar package with organic substrate. An additional silicon heat spreader was designed and attached to the package for high power application. Thermal analysis was performed to optimize package thermal performances and experimental validation was carried out. The designed 3-D stack package is suitable for 20 W application.
Keywords
integrated circuit packaging; power integrated circuits; thermal management (packaging); 3-D stack package; electrical connections; memory chips; silicon interposer; stacking; thermal bridging; thermal resistance; Application specific integrated circuits; Assembly; Electric resistance; Packaging; Performance analysis; Performance evaluation; Silicon; Stacking; Thermal conductivity; Thermal resistance; High-power 3-D package design; silicon carrier; through silicon via;
fLanguage
English
Journal_Title
Advanced Packaging, IEEE Transactions on
Publisher
ieee
ISSN
1521-3323
Type
jour
DOI
10.1109/TADVP.2008.915854
Filename
4447324
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