DocumentCode
1064986
Title
Optimum beam size for high-speed drawing of LSI patterns by variably shaped rectangular electron beams
Author
Hoh, Koitiro ; Sugiyama, Naoshi ; Tarui, Yasuo
Author_Institution
VLSI Technology Research Association, Kawasaki, Japan
Volume
26
Issue
9
fYear
1979
fDate
9/1/1979 12:00:00 AM
Firstpage
1363
Lastpage
1365
Abstract
The drawing time of the vector-scan electron-beam exposure systems employing variably shaped rectangular (VSR) beams is calculated and the optimum value of the maximum dimension of the rectangle is found which makes the drawing time minimum under the condition that the edge slope is within a certain fraction of the linewidth.
Keywords
Apertures; Electron beams; High speed optical techniques; Large scale integration; Lithography; Optical control; Optical devices; Particle beams; Shape control; Silicon;
fLanguage
English
Journal_Title
Electron Devices, IEEE Transactions on
Publisher
ieee
ISSN
0018-9383
Type
jour
DOI
10.1109/T-ED.1979.19608
Filename
1480186
Link To Document