DocumentCode
1066009
Title
MP-B2 selective oxidation of silicon in RF-induced oxygen plasma
Author
Sugano, Tatsuya
Volume
26
Issue
11
fYear
1979
fDate
11/1/1979 12:00:00 AM
Firstpage
1830
Lastpage
1830
Keywords
Interface states; Isolation technology; Oxidation; Plasma materials processing; Plasma measurements; Plasma temperature; Semiconductor films; Silicon compounds; Stacking; Substrates;
fLanguage
English
Journal_Title
Electron Devices, IEEE Transactions on
Publisher
ieee
ISSN
0018-9383
Type
jour
DOI
10.1109/T-ED.1979.19707
Filename
1480285
Link To Document