DocumentCode
1066059
Title
MP-B6 a nonvolatile static RAM cell utilizing a silicon dioxide, thin silicon nitride layer-silicon dioxide gate insulator
Author
Waites, R.F. ; Sze Hon Kwan
Volume
26
Issue
11
fYear
1979
fDate
11/1/1979 12:00:00 AM
Firstpage
1832
Lastpage
1832
Keywords
Insulation; MOSFETs; Nonvolatile memory; Polarization; Random access memory; Read-write memory; Silicon compounds; Subthreshold current; Threshold voltage; Transistors;
fLanguage
English
Journal_Title
Electron Devices, IEEE Transactions on
Publisher
ieee
ISSN
0018-9383
Type
jour
DOI
10.1109/T-ED.1979.19712
Filename
1480290
Link To Document