• DocumentCode
    1066942
  • Title

    Inverted mesa-type quartz crystal resonators fabricated by deep-reactive ion etching

  • Author

    Abe, Takashi ; Hung, Vu ; Esashi, Masayoshi

  • Author_Institution
    Member; Graduate School of Engineering, Tohoku University, Aramaki, Aoba-ku, Sendai 980-8579, Japan
  • Volume
    53
  • Issue
    7
  • fYear
    2006
  • fDate
    7/1/2006 12:00:00 AM
  • Firstpage
    1234
  • Lastpage
    1236
  • Abstract
    In this letter, we present experimental data showing Q change versus thickness for a quartz-crystal resonator fabricated with deep-reactive ion etching. Measurements show that Q increases as etch depth increases, and further that Q can be optimized as a function of etch depth and diameter of the resonator.
  • Keywords
    Crystals; Electrodes; Etching; Q factor; Resonant frequency; Sensors;
  • fLanguage
    English
  • Journal_Title
    Ultrasonics, Ferroelectrics, and Frequency Control, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0885-3010
  • Type

    jour

  • DOI
    10.1109/TUFFC.2006.1665070
  • Filename
    1665070
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=1066942