DocumentCode
1069673
Title
Magnetostriction in amorphous Gd2Fe14B thin films
Author
Bushnell, S.E. ; Vittoria, C.
Author_Institution
Dept. of Electr. & Comput. Eng., Northeastern Univ., Boston, MA, USA
Volume
29
Issue
6
fYear
1993
fDate
11/1/1993 12:00:00 AM
Firstpage
3379
Lastpage
3381
Abstract
Films 222 nm thick were sputtered from a stoichiometric Gd2 Fe14B sintered target for the purpose of establishing their magnetoelastic properties. They were deposited onto precut rectangular coverglasses and Si substrates using ion beam sputtering. The saturation magnetostriction coefficient (λs), was measured using a ferromagnetic resonance (FMR) technique where the same specimen was characterized in the as-deposited state and after having been annealed at 300°C in gettered Ar for 30 min. The average values for (λs) were determined to be +19.9×10-6 and +34.6×10-6, respectively
Keywords
amorphous state; annealing; boron alloys; ferromagnetic resonance; gadolinium alloys; iron alloys; magnetic thin films; magnetoelastic effects; magnetostriction; sputtered coatings; 300 degC; Si substrates; amorphous Gd2Fe14B thin films; ferromagnetic resonance; gettered Ar; ion beam sputtering; magnetoelastic properties; precut rectangular coverglasses; saturation magnetostriction coefficient; stoichiometric Gd2Fe14B sintered target; Amorphous materials; Annealing; Iron; Magnetic films; Magnetic resonance; Magnetostriction; Stress; Substrates; Transistors; Variable speed drives;
fLanguage
English
Journal_Title
Magnetics, IEEE Transactions on
Publisher
ieee
ISSN
0018-9464
Type
jour
DOI
10.1109/20.280821
Filename
280821
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