• DocumentCode
    1069696
  • Title

    A two-dimensional computer analysis of triode-like characteristics of short-channel MOSFET´s

  • Author

    Dang, Luong Mo ; Konaka, Masami

  • Author_Institution
    Toshiba Corporation, Saiwaiku, Kawasaki, Japan
  • Volume
    27
  • Issue
    8
  • fYear
    1980
  • fDate
    8/1/1980 12:00:00 AM
  • Firstpage
    1533
  • Lastpage
    1539
  • Abstract
    Some new understandings on the triode-like behavior and the "punchthrough mode" operation of a short-channel MOSFET are obtained based on a two-dimensional computer simulation. The drain current of a MOSFET is essentially space-charge-limited, showing a shift from a pentode-like behavior to a triode-like behavior with decreasing (source-drain distance/gate oxide thickness) ratios which serve to manifest the relative modulations by the gate and the drain upon the channel conductivity. In a short-channel MOSFET, the triode-like behavior is more accentuated by a "punchthrough effect" due to a lowering of the potential barrier at the source by the drain field. The current thus resulted includes a gate-uncontrollable component flowing deep in the bulk, which is termed "punchthrough current" to distinguish it from the gate-controllable component characterizing the triode-like behavior. Optimized conditions for a device for reducing the "punch-through current," are also described in detail.
  • Keywords
    Computer simulation; Conductivity; Current density; Electron mobility; Impurities; MOSFET circuits; Permittivity; Poisson equations; Silicon; Voltage;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/T-ED.1980.20067
  • Filename
    1480860