DocumentCode
1069696
Title
A two-dimensional computer analysis of triode-like characteristics of short-channel MOSFET´s
Author
Dang, Luong Mo ; Konaka, Masami
Author_Institution
Toshiba Corporation, Saiwaiku, Kawasaki, Japan
Volume
27
Issue
8
fYear
1980
fDate
8/1/1980 12:00:00 AM
Firstpage
1533
Lastpage
1539
Abstract
Some new understandings on the triode-like behavior and the "punchthrough mode" operation of a short-channel MOSFET are obtained based on a two-dimensional computer simulation. The drain current of a MOSFET is essentially space-charge-limited, showing a shift from a pentode-like behavior to a triode-like behavior with decreasing (source-drain distance/gate oxide thickness) ratios which serve to manifest the relative modulations by the gate and the drain upon the channel conductivity. In a short-channel MOSFET, the triode-like behavior is more accentuated by a "punchthrough effect" due to a lowering of the potential barrier at the source by the drain field. The current thus resulted includes a gate-uncontrollable component flowing deep in the bulk, which is termed "punchthrough current" to distinguish it from the gate-controllable component characterizing the triode-like behavior. Optimized conditions for a device for reducing the "punch-through current," are also described in detail.
Keywords
Computer simulation; Conductivity; Current density; Electron mobility; Impurities; MOSFET circuits; Permittivity; Poisson equations; Silicon; Voltage;
fLanguage
English
Journal_Title
Electron Devices, IEEE Transactions on
Publisher
ieee
ISSN
0018-9383
Type
jour
DOI
10.1109/T-ED.1980.20067
Filename
1480860
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