DocumentCode

1071326

Title

WA-A5 a new doping technique without SiO2patterning using an inorganic photoresist

Author

Yoshikawa, Akira ; Takeda, Akiko ; Mizushima, Y.

Volume

27

Issue

11

fYear

1980

fDate

11/1/1980 12:00:00 AM

Firstpage

2194

Lastpage

2194

Keywords

Amorphous materials; Amorphous semiconductors; Atomic layer deposition; Doping; FETs; Impurities; Laboratories; Polymer films; Resists; Surface treatment;

fLanguage

English

Journal_Title

Electron Devices, IEEE Transactions on

Publisher

ieee

ISSN

0018-9383

Type

jour

DOI

10.1109/T-ED.1980.20226

Filename

1481019