Permittivity characterization of low-k thin films from transmission-line measurements

Author

Janezic, Michael D. ; Williams, Dylan F. ; Blaschke, Volker ; Karamcheti, Arun ; Chang, Chi Shih

Author_Institution

Nat. Inst. of Stand. & Technol., Boulder, CO, USA

Volume

51

Issue

1

fYear

2003

fDate

1/1/2003 12:00:00 AM

Firstpage

132

Lastpage

136

Abstract

Developed a broad-band technique for measuring the relative permittivity of low-k thin films using microstrip transmission-line measurements. From measurements of the complex microstrip propagation constant and the characteristic impedance, we determined the relative permittivity of thin films incorporated in microstrip lines. We present measurement results to 40 GHz for both an oxide and a bisbenzocyclobutene low-k thin film and show a variability of permittivity of approximately ±5% over the entire frequency range.

Keywords

dielectric thin films; microstrip lines; microwave measurement; permittivity measurement; 0 to 40 GHz; bisbenzocyclobutene; characteristic impedance; complex microstrip propagation constant; low-k thin films; microstrip transmission-line measurements; permittivity characterization; relative permittivity; Conductive films; Dielectric measurements; Dielectric thin films; Frequency measurement; Microstrip; Permittivity measurement; Propagation constant; Transistors; Transmission line measurements; Transmission lines;

fLanguage

English

Journal_Title

Microwave Theory and Techniques, IEEE Transactions on

Publisher

ieee

ISSN

0018-9480

Type

jour

DOI

10.1109/TMTT.2002.806925

Filename

1159675