DocumentCode
1072570
Title
P-type anode structure for GaAs TEDs on semi-insulating substrate
Author
Kurumada, Katsuhiko ; Asai, Kazuyoshi ; Ishii, Yasunobu
Author_Institution
Musashino Electrical Communication Laboratory, Tokyo, Japan
Volume
1
Issue
9
fYear
1980
fDate
9/1/1980 12:00:00 AM
Firstpage
167
Lastpage
169
Abstract
The use of a p-type anode in a planar GaAs Gunn device was studied for the first time. The undesirable decrease of current for dc bias, compared with pulsed bias, is eliminated by hole injection to the overcritically doped n-layer from a p-n junction anode. These devices have exhibited satisfactory Gunn domain operation for triggered dc operation.
Keywords
Anodes; Buffer layers; Cathodes; Electrodes; Electron traps; Gallium arsenide; Gunn devices; Interface phenomena; P-n junctions; Space charge;
fLanguage
English
Journal_Title
Electron Device Letters, IEEE
Publisher
ieee
ISSN
0741-3106
Type
jour
DOI
10.1109/EDL.1980.25275
Filename
1481137
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