DocumentCode
1072581
Title
A new method to determine MOSFET channel length
Author
Chern, John G J ; Chang, Peter ; Motta, Richard F. ; Godinho, Norm
Author_Institution
Zilog Inc., Cupertino, California
Volume
1
Issue
9
fYear
1980
fDate
9/1/1980 12:00:00 AM
Firstpage
170
Lastpage
173
Abstract
A new method is proposed to electrically determine MOS transistor channel length with both accuracy and convenience. Based on the linear region relationship between effective channel length Leff and channel resistance Rchan of an MOS transistor, this method determines Leff by applying relatively large but constant gate voltage to eliminate threshold voltage determination and takes into account external resistance. Comparison of this method with SEM measurement shows very good agreement (within ±0.1 µm resolution limit of our SEM technique).
Keywords
Capacitance measurement; Conductivity measurement; Contact resistance; Electrical resistance measurement; Intrusion detection; Length measurement; MOSFET circuits; Scanning electron microscopy; Testing; Threshold voltage;
fLanguage
English
Journal_Title
Electron Device Letters, IEEE
Publisher
ieee
ISSN
0741-3106
Type
jour
DOI
10.1109/EDL.1980.25276
Filename
1481138
Link To Document