DocumentCode
1072958
Title
Plasma processes in electron-beam controlled rare-gas halide lasers
Author
Nighan, William L.
Author_Institution
United Technologies Research Center, East Hartford, CT, USA
Volume
14
Issue
10
fYear
1978
fDate
10/1/1978 12:00:00 AM
Firstpage
714
Lastpage
726
Abstract
This paper presents the results of an analysis of plasma properties in an electron-beam controlled KrF* laser discharge. In this study, special emphasis is placed on establishing the relationship among the numerous kinetic processes influencing the populations of excited species in the laser medium, important reactions controlling the coupled populations of rare-gas metastable states and higher excited states are discussed in detail, along with the resultant effect of these reactions on KrF* formation efficiency. It is shown that the rare-gas monohalide production efficiency is approximately 20 percent under typical conditions, and that no single reaction dominates either production or loss of KrF*. In addition, the very important role of halogen molecule dissociation is treated and the resultant effects of dissociation on the temporal variations of plasma properties and on plasma stability are analyzed.
Keywords
Chemical lasers; Electrons; Gas lasers; Kinetic theory; Laser excitation; Metastasis; Optical control; Plasma properties; Process control; Production;
fLanguage
English
Journal_Title
Quantum Electronics, IEEE Journal of
Publisher
ieee
ISSN
0018-9197
Type
jour
DOI
10.1109/JQE.1978.1069694
Filename
1069694
Link To Document