• DocumentCode
    1076345
  • Title

    Electrical characteristics of an E-beam controlled KrF*discharge

  • Author

    Long, William H., Jr. ; Bradford, Robert S., Jr.

  • Author_Institution
    Northrop Research and Technology Center, Palos Verdes Peninsula, CA, USA
  • Volume
    15
  • Issue
    5
  • fYear
    1979
  • fDate
    5/1/1979 12:00:00 AM
  • Firstpage
    327
  • Lastpage
    331
  • Abstract
    Plasma electrical characteristics have been measured as a function of e -beam current density (JB) and fluorine concentration for Ar, Kr, and F2gas mixtures in order to identify the stable operating regime of KrF* laser interest. The data were obtained from a 120 cm3active volume e -beam controlled discharge laser. The optimum F2concentration was found to be 0.17 percent at JB= 17.9 A/cm2. This mixture also gave the best laser extraction efficiency and consequently produced the highest laser output energy. The dissociative electron attachment rate constant in the laser mixture was determined from the discharge voltage and current measurements.
  • Keywords
    Noble-gas lasers; Plasmas; Ultraviolet lasers; Current density; Current measurement; Density measurement; Electric variables; Electric variables measurement; Gas lasers; Plasma density; Plasma measurements; Plasma properties; Plasma stability;
  • fLanguage
    English
  • Journal_Title
    Quantum Electronics, IEEE Journal of
  • Publisher
    ieee
  • ISSN
    0018-9197
  • Type

    jour

  • DOI
    10.1109/JQE.1979.1070008
  • Filename
    1070008
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=1076345