• DocumentCode
    1076707
  • Title

    Some device aspects of the epitaxial collector IIL/MTL technology

  • Author

    Tjia, Vincent H H ; Koopmans, Jan M. ; Vrijmoed, Hans ; Poorter, Teunis

  • Author_Institution
    Delft University of Technology, Delft, The Netherlands
  • Volume
    28
  • Issue
    12
  • fYear
    1981
  • fDate
    12/1/1981 12:00:00 AM
  • Firstpage
    1474
  • Lastpage
    1479
  • Abstract
    Device aspects of the epitaxial collector IIL/MTL configuration incorporating Schottky-barrier junctions (SBJ´s) as output contacts (Schottky coupled IIL or Schottky coupled transistor logic) and V-grooves as lateral isolation is discussed. Typical figures for single output gates are a power-delay product of 0.10-0.18 pJ and a minimum propagation delay of 3.5-5 ns with 5- 7.5-µm design rules. Using shallow epitaxy and a reduced effective temperature of the high temperature processing steps, a 1-ns speed operation is predicted with a 4-µm feature size, thus approaching other advanced bipolar logic performances, while maintaining IIL power economy, gate density, and layouting flexibility.
  • Keywords
    Boron; Epitaxial growth; Epitaxial layers; Etching; Isolation technology; Large scale integration; Logic devices; Propagation delay; Substrates; Temperature;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/T-ED.1981.20633
  • Filename
    1481785