DocumentCode

1081556

Title

IIIB-5 high voltage electron beam lithography for VLSI fabrication

Author

Yoshimi, Masato ; Takahashi, Masaharu ; Kawabuchi, K. ; Kato, Yu ; Takigawa, T.

Volume

29

Issue

10

fYear

1982

fDate

10/1/1982 12:00:00 AM

Firstpage

1678

Lastpage

1679

Keywords

Bipolar transistors; CMOS process; Circuits; Contact resistance; Electron beams; Fabrication; Lithography; Resists; Very large scale integration; Voltage;

fLanguage

English

Journal_Title

Electron Devices, IEEE Transactions on

Publisher

ieee

ISSN

0018-9383

Type

jour

DOI

10.1109/T-ED.1982.20964

Filename

1482461