• DocumentCode
    108360
  • Title

    Deep-Level Characterization in GaN HEMTs-Part I: Advantages and Limitations of Drain Current Transient Measurements

  • Author

    Bisi, Davide ; Meneghini, Matteo ; De Santi, C. ; Chini, Alessandro ; Dammann, Michael ; Bruckner, P. ; Mikulla, Michael ; Meneghesso, Gaudenzio ; Zanoni, Enrico

  • Author_Institution
    Dept. of Inf. Eng., Univ. of Padova, Padua, Italy
  • Volume
    60
  • Issue
    10
  • fYear
    2013
  • fDate
    Oct. 2013
  • Firstpage
    3166
  • Lastpage
    3175
  • Abstract
    This paper critically investigates the advantages and limitations of the current-transient methods used for the study of the deep levels in GaN-based high-electron mobility transistors (HEMTs), by evaluating how the procedures adopted for measurement and data analysis can influence the results of the investigation. The article is divided in two parts within Part I. 1) We analyze how the choice of the measurement and analysis parameters (such as the voltage levels used to induce the trapping phenomena and monitor the current transients, the duration of the filling pulses, and the method used for the extrapolation of the time constants of the capture/emission processes) can influence the results of the drain current transient investigation and can provide information on the location of the trap levels responsible for current collapse. 2) We present a database of defects described in more than 60 papers on GaN technology, which can be used to extract information on the nature and origin of the trap levels responsible for current collapse in AlGaN/GaN HEMTs. Within Part II, we investigate how self-heating can modify the results of drain current transient measurements on the basis of combined experimental activity and device simulation.
  • Keywords
    III-V semiconductors; electric current measurement; gallium compounds; high electron mobility transistors; wide band gap semiconductors; AlGaN-GaN; capture-emission process; current collapse; deep-level characterization; device simulation; drain current transient measurement; filling pulse duration; gallium nitride HEMT; high-electron mobility transistors; time constant extrapolation; trap level location; trapping phenomena; voltage level; Charge carrier processes; Current measurement; Gallium nitride; HEMTs; Logic gates; MODFETs; Transient analysis; Activation energy; deep level; gallium nitride (GaN); high electron mobility transistors; traps;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/TED.2013.2279021
  • Filename
    6588607