• DocumentCode
    1086889
  • Title

    Study of the input and reverse transfer capacitance of vertical MOS transistors

  • Author

    Miller, Gerhard Johann

  • Author_Institution
    Technische Universität München, München, Federal Republic of Germany
  • Volume
    30
  • Issue
    10
  • fYear
    1983
  • fDate
    10/1/1983 12:00:00 AM
  • Firstpage
    1344
  • Lastpage
    1347
  • Abstract
    The input capacitance of vertical MOS transistors shows, when it is measured in the current flow state, much higher values than in the currentless state ( V_{GS} = 0 ). This can partly be attributed to the Miller-effect with the internal drain series resistance of the epitaxial layer working as a load resistance. Moreover there is an additional increase of the reverse transfer capacitance by more than an order of magnitude because of accumulation beneath the gate. This effect more or less depends on the current according to the epi-doping, and it occurs especially on transition from the linear to the pentode region. Measurements of the input and computed values of the reverse tranfer capacitance and its dependence on current will be presented for transistors with different dopings and heights of the epitaxial layer.
  • Keywords
    Capacitance measurement; Current measurement; Doping; Electrical resistance measurement; Epitaxial layers; Fluid flow measurement; MOSFET circuits; Substrates; Virtual manufacturing; Voltage;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/T-ED.1983.21296
  • Filename
    1483197