Monolithic integration of multilayer filter on vertical surface of semiconductor substrate by a bias-sputtering technique

Author

Baba, T. ; Tamura, S. ; Kokubun, Y. ; Watanabe, S.

Author_Institution

Div. of Electr. & Comput. Eng., Yokohama Nat. Univ., Japan

Volume

2

Issue

3

fYear

1990

fDate

3/1/1990 12:00:00 AM

Firstpage

191

Lastpage

193

Abstract

The selective formation of dielectric film on a vertical surface of a substrate by a bias-sputtering technique is discussed. Using this technique it has been possible to achieve the monolithic integration of a multilayer wavelength filter and waveguide photodetector on a vertical surface of a semiconductor substrate. The wavelength filter can be applied to an integrated demultiplexer and photodetector by fabricating an optical waveguide directly on the substrate.<>

Keywords

integrated optics; optical filters; optical waveguides; photodetectors; semiconductors; sputter deposition; substrates; bias-sputtering technique; dielectric film; integrated demultiplexer; monolithic integration; multilayer filter; multilayer wavelength filter; optical waveguide; semiconductor substrate; sputter deposition; vertical surface; waveguide photodetector; Dielectric films; Dielectric substrates; Monolithic integrated circuits; Nonhomogeneous media; Optical filters; Optical surface waves; Optical waveguides; Photodetectors; Semiconductor waveguides; Surface waves;

fLanguage

English

Journal_Title

Photonics Technology Letters, IEEE

Publisher

ieee

ISSN

1041-1135

Type

jour

DOI

10.1109/68.50886

Filename

50886