DocumentCode
1088626
Title
Effect of illumination wavelength and intensity on minority-carrier diffusion length of EFG silicon ribbon solar cells
Author
Shimokawa, Ryuichi ; Hayashi, Yutaka
Author_Institution
Electrotechnical Laboratory, Ibaraki, Japan
Volume
30
Issue
12
fYear
1983
fDate
12/1/1983 12:00:00 AM
Firstpage
1770
Lastpage
1775
Abstract
Local spectral photoresponses of the edge-defined film-fed growth technique (EFG) ribbon solar cells were measured as a function of the bias light wavelength and intensity. The minority-carrier diffusion length estimated from the spectral response measurement of the short-circuit current (JSc ) was found to increase semilogarithmically with the intensity at various bias light wavelengths, and to increase with the bias fight wavelength for the constant intensity in the position with a medium diffusion length (≃20 µm). In the position with a longer (≃89 µm) or shorter (≃7 µm) diffusion length, the bias light wavelength, however, had a smaller influence on the diffusion length. The effect of the bias light wavelength and intensity on the diffusion length is theoretically explained by a model of filling deep traps by photo-injected minority carriers.
Keywords
Integrated circuit technology; Length measurement; Lighting; Metal-insulator structures; Photovoltaic cells; Physics; Plasma properties; Silicon; Very large scale integration; Wavelength measurement;
fLanguage
English
Journal_Title
Electron Devices, IEEE Transactions on
Publisher
ieee
ISSN
0018-9383
Type
jour
DOI
10.1109/T-ED.1983.21443
Filename
1483344
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