• DocumentCode
    1088626
  • Title

    Effect of illumination wavelength and intensity on minority-carrier diffusion length of EFG silicon ribbon solar cells

  • Author

    Shimokawa, Ryuichi ; Hayashi, Yutaka

  • Author_Institution
    Electrotechnical Laboratory, Ibaraki, Japan
  • Volume
    30
  • Issue
    12
  • fYear
    1983
  • fDate
    12/1/1983 12:00:00 AM
  • Firstpage
    1770
  • Lastpage
    1775
  • Abstract
    Local spectral photoresponses of the edge-defined film-fed growth technique (EFG) ribbon solar cells were measured as a function of the bias light wavelength and intensity. The minority-carrier diffusion length estimated from the spectral response measurement of the short-circuit current (JSc) was found to increase semilogarithmically with the intensity at various bias light wavelengths, and to increase with the bias fight wavelength for the constant intensity in the position with a medium diffusion length (≃20 µm). In the position with a longer (≃89 µm) or shorter (≃7 µm) diffusion length, the bias light wavelength, however, had a smaller influence on the diffusion length. The effect of the bias light wavelength and intensity on the diffusion length is theoretically explained by a model of filling deep traps by photo-injected minority carriers.
  • Keywords
    Integrated circuit technology; Length measurement; Lighting; Metal-insulator structures; Photovoltaic cells; Physics; Plasma properties; Silicon; Very large scale integration; Wavelength measurement;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/T-ED.1983.21443
  • Filename
    1483344