Rapid thermal multiprocessing for a programmable factory for adaptable manufacturing of ICs

This paper presents an overview of research at Stanford University on the development of concepts of a programmable factory, based on a new generation of flexible multifunctional equipment implemented in a smaller flexible factory. This approach is demonstrated through the development of a novel single wafer Rapid Thermal Multiprocessing (RTM) reactor with extensive integration of sensors, computers and related technology for specification, communication, execution, monitoring, control, and diagnosis to demonstrate the programmable nature of the RTM. The RTM combines rapid thermal processing and several other process environments in a single chamber, with applications for multilayer in-situ growth and deposition of dielectrics, semiconductors and metals. Because it is highly instrumented, the RTM is very flexible for in-situ multiprocessing, allowing rapid cycling of ambient gases, temperature, pressure, etc. It allows several processing steps to be executed sequentially in-situ, while providing sufficient flexibility to allow optimization of each processing step. This flexibility is partially the result of a new lamp system with three concentric rings each of which is independently and dynamically controlled to provide for better control over the spatial and temporal optical flux profile resulting in excellent temperature uniformity over a wide range of process conditions namely temperatures, pressures and gas flow rates. The lamp system has been optimally designed through the use of a newly developed thermal simulator. For equipment and process control, a variety of sensors for real-time measurements and a model based control system have been developed