• DocumentCode
    1094258
  • Title

    Characteristic Features of 1-D Ballistic Transport in Nanowire MOSFETs

  • Author

    Kim, Raseong ; Lundstrom, Mark S.

  • Author_Institution
    Sch. of Electr. & Comput. Eng., Purdue Univ., West Lafayette, IN
  • Volume
    7
  • Issue
    6
  • fYear
    2008
  • Firstpage
    787
  • Lastpage
    794
  • Abstract
    In this paper, we theoretically investigate characteristic features of 1-D, ballistic transport in nanowire (NW) MOSFETs. An analytic model at T = 0 K is first derived using the top-of-the-barrier ballistic transport model. When the drain voltage is low, this model shows that the drain current increases stepwise with increasing gate voltage, and the transconductance vs. gate voltage displays spikes. These features are the most evident signatures of 1-D transport. Next, we examine the finite-temperature performance numerically and show how I-V characteristics change as device parameters and temperature are varied. Finally, recently reported silicon NW gate-all-around MOSFETs are analyzed with our model. We show that some quantum features of these experiments can be explained with our simple, ballistic model. This approach may be a possible tool for subband spectroscopy and device performance assessment.
  • Keywords
    MOSFET; ballistic transport; elemental semiconductors; nanowires; semiconductor device models; semiconductor quantum wires; silicon; 1D ballistic transport model; I-V characteristics; Si; drain current; drain voltage; silicon nanowire MOSFETs; subband spectroscopy; transconductance; Ballistic transport; MOSFETs; ballistic transport; nanowire (NW) transistor; nanowire transistor; quantum wires; semiconductor device modeling;
  • fLanguage
    English
  • Journal_Title
    Nanotechnology, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    1536-125X
  • Type

    jour

  • DOI
    10.1109/TNANO.2008.920196
  • Filename
    4468038