DocumentCode
1094258
Title
Characteristic Features of 1-D Ballistic Transport in Nanowire MOSFETs
Author
Kim, Raseong ; Lundstrom, Mark S.
Author_Institution
Sch. of Electr. & Comput. Eng., Purdue Univ., West Lafayette, IN
Volume
7
Issue
6
fYear
2008
Firstpage
787
Lastpage
794
Abstract
In this paper, we theoretically investigate characteristic features of 1-D, ballistic transport in nanowire (NW) MOSFETs. An analytic model at T = 0 K is first derived using the top-of-the-barrier ballistic transport model. When the drain voltage is low, this model shows that the drain current increases stepwise with increasing gate voltage, and the transconductance vs. gate voltage displays spikes. These features are the most evident signatures of 1-D transport. Next, we examine the finite-temperature performance numerically and show how I-V characteristics change as device parameters and temperature are varied. Finally, recently reported silicon NW gate-all-around MOSFETs are analyzed with our model. We show that some quantum features of these experiments can be explained with our simple, ballistic model. This approach may be a possible tool for subband spectroscopy and device performance assessment.
Keywords
MOSFET; ballistic transport; elemental semiconductors; nanowires; semiconductor device models; semiconductor quantum wires; silicon; 1D ballistic transport model; I-V characteristics; Si; drain current; drain voltage; silicon nanowire MOSFETs; subband spectroscopy; transconductance; Ballistic transport; MOSFETs; ballistic transport; nanowire (NW) transistor; nanowire transistor; quantum wires; semiconductor device modeling;
fLanguage
English
Journal_Title
Nanotechnology, IEEE Transactions on
Publisher
ieee
ISSN
1536-125X
Type
jour
DOI
10.1109/TNANO.2008.920196
Filename
4468038
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