• DocumentCode
    1094404
  • Title

    Monte Carlo simulation of bipolar transistors

  • Author

    Park, Young-June ; Navon, David H. ; Tang, Ting-wei

  • Author_Institution
    IBM General Technology Division, Hopewell Junction, NY
  • Volume
    31
  • Issue
    12
  • fYear
    1984
  • fDate
    12/1/1984 12:00:00 AM
  • Firstpage
    1724
  • Lastpage
    1730
  • Abstract
    A new approach is proposed to investigate, the limits of validity of the conventional drift-diffusion equation analysis for modeling bipolar transistor structures containing submicrometer dimensions. The single-particle Monte Carlo method is used for the solution of the Boltzmann equation. An electron velocity overshoot of 1.8 times the static saturation velocity has been found for electrons near the base-collector junction of a silicon device. The effect of this velocity overshoot was calculated to enhance the output collector current and reduce the electron transit time by 5 percent for the device structure considered in this work.
  • Keywords
    Bipolar transistors; Boltzmann equation; Current density; Electron mobility; Helium; Hot carriers; MOSFET circuits; Monte Carlo methods; Particle scattering; Silicon;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/T-ED.1984.21778
  • Filename
    1484063