DocumentCode
1094404
Title
Monte Carlo simulation of bipolar transistors
Author
Park, Young-June ; Navon, David H. ; Tang, Ting-wei
Author_Institution
IBM General Technology Division, Hopewell Junction, NY
Volume
31
Issue
12
fYear
1984
fDate
12/1/1984 12:00:00 AM
Firstpage
1724
Lastpage
1730
Abstract
A new approach is proposed to investigate, the limits of validity of the conventional drift-diffusion equation analysis for modeling bipolar transistor structures containing submicrometer dimensions. The single-particle Monte Carlo method is used for the solution of the Boltzmann equation. An electron velocity overshoot of 1.8 times the static saturation velocity has been found for electrons near the base-collector junction of a silicon device. The effect of this velocity overshoot was calculated to enhance the output collector current and reduce the electron transit time by 5 percent for the device structure considered in this work.
Keywords
Bipolar transistors; Boltzmann equation; Current density; Electron mobility; Helium; Hot carriers; MOSFET circuits; Monte Carlo methods; Particle scattering; Silicon;
fLanguage
English
Journal_Title
Electron Devices, IEEE Transactions on
Publisher
ieee
ISSN
0018-9383
Type
jour
DOI
10.1109/T-ED.1984.21778
Filename
1484063
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