• DocumentCode
    1097470
  • Title

    p-Channel (Al,Ga)As/GaAs modulation-doped logic gates

  • Author

    Kiehl, R.A. ; Gossard, A.C.

  • Author_Institution
    AT&T Bell Laboratories, Murray Hill, NJ
  • Volume
    5
  • Issue
    10
  • fYear
    1984
  • fDate
    10/1/1984 12:00:00 AM
  • Firstpage
    420
  • Lastpage
    422
  • Abstract
    The operation of logic gates composed of modulation-doped field-effect transistors based on two-dimensional hole-gas conduction is reported for the first time. Direct coupled inverters fabricated on an MBE grown Be-doped (Al,Ga)As/GaAs wafer having a sheet density of 1.5 × 1012cm-2and a 77K mobility of 1800 cm2/V.s exhibit logic states of -0.25 and -0.98 V at 77K for a - 1-V bias. Propagation delays of 233.0 ps/gate are obtained at 77K in ring-oscillator circuits with a power dissipation of 0.31 mW/gate. Power-delay products as low as 9.1 fJ are also obtained.
  • Keywords
    Circuits; Epitaxial layers; FETs; Gallium arsenide; Logic gates; Propagation delay; Pulse inverters; Temperature; Transconductance; Voltage;
  • fLanguage
    English
  • Journal_Title
    Electron Device Letters, IEEE
  • Publisher
    ieee
  • ISSN
    0741-3106
  • Type

    jour

  • DOI
    10.1109/EDL.1984.25970
  • Filename
    1484346