DocumentCode
1099373
Title
The Hooge parameters of n+-p-n and p+-n-p silicon bipolar transistors
Author
Zhu, Xichen ; Van Der Ziel, Aldert
Author_Institution
Kunming Institute of Physics, People´´s Republic of China
Volume
32
Issue
3
fYear
1985
fDate
3/1/1985 12:00:00 AM
Firstpage
658
Lastpage
661
Abstract
We establish here again the fact that the Hooge parameters of NEC57807 n+-p-n and in GE82 p+-n-p silicon bipolar transistors are orders of magnitude smaller than the value 2 × 10-3postulated earlier. In the NEC57807 devices neither the base 1/
noise nor the collector 1/
noise is of the diffusion-fluctuation type. In the GE82 devices the collector 1/
noise is not of the diffusion-fluctuation type, but the base 1/
noise is of that type. We have given, also, a theory of the effects of surface recombination fluctuations in the emitter-base space-charge region on the base noise and the collector noise and find a noise spectrum that varies as
where 0.5 < γ < 1.6 when going from small to large currents.
noise nor the collector 1/
noise is of the diffusion-fluctuation type. In the GE82 devices the collector 1/
noise is not of the diffusion-fluctuation type, but the base 1/
noise is of that type. We have given, also, a theory of the effects of surface recombination fluctuations in the emitter-base space-charge region on the base noise and the collector noise and find a noise spectrum that varies as
where 0.5 < γ < 1.6 when going from small to large currents.Keywords
Bipolar integrated circuits; Bipolar transistors; Diodes; Electron emission; Electron mobility; Fluctuations; Frequency; Integrated circuit noise; MOSFETs; Temperature;
fLanguage
English
Journal_Title
Electron Devices, IEEE Transactions on
Publisher
ieee
ISSN
0018-9383
Type
jour
DOI
10.1109/T-ED.1985.21994
Filename
1484740
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