DocumentCode
110020
Title
Current–Voltage Characteristics of GeSn/Ge Heterojunction Diodes Grown by Molecular Beam Epitaxy
Author
Sangcheol Kim ; Gupta, Jyoti ; Bhargava, Neeraj ; Coppinger, Matthew ; Kolodzey, J.
Author_Institution
Dept. of Electr. & Comput. Eng., Univ. of Delaware, Newark, DE, USA
Volume
34
Issue
10
fYear
2013
fDate
Oct. 2013
Firstpage
1217
Lastpage
1219
Abstract
Heterojunction diodes of p-GeSn/n-Ge were fabricated by solid-source molecular beam epitaxy on Ge substrates to investigate their electrical properties. Measurements of the current-voltage characteristics and their temperature and composition dependence were performed to extract the diode parameters of reverse saturation current, ideality factor, series resistance, and shunt resistance. The diodes showed good rectifying behavior with low turn-ON voltages in forward bias. The reverse saturation current increased with increasing Sn content and increasing temperature, and the magnitude of the breakdown voltage decreased with increasing temperature. These results suggest that Ge-Sn diodes may be useful for Ge-based circuits and optoelectronics.
Keywords
elemental semiconductors; germanium; germanium alloys; molecular beam epitaxial growth; p-n heterojunctions; semiconductor diodes; tin alloys; Ge; Ge substrates; GeSn; breakdown voltage; current-voltage characteristics; diode parameters; heterojunction diodes; ideality factor; reverse saturation current; series resistance; shunt resistance; solid-source molecular beam epitaxy; Doping; Heterojunctions; P-i-n diodes; Photonic band gap; Temperature; Temperature measurement; Tin; Germanium (Ge); germanium-tin (Ge-Sn); heterojunction diodes; tin (Sn);
fLanguage
English
Journal_Title
Electron Device Letters, IEEE
Publisher
ieee
ISSN
0741-3106
Type
jour
DOI
10.1109/LED.2013.2278371
Filename
6588937
Link To Document