• DocumentCode
    110020
  • Title

    Current–Voltage Characteristics of GeSn/Ge Heterojunction Diodes Grown by Molecular Beam Epitaxy

  • Author

    Sangcheol Kim ; Gupta, Jyoti ; Bhargava, Neeraj ; Coppinger, Matthew ; Kolodzey, J.

  • Author_Institution
    Dept. of Electr. & Comput. Eng., Univ. of Delaware, Newark, DE, USA
  • Volume
    34
  • Issue
    10
  • fYear
    2013
  • fDate
    Oct. 2013
  • Firstpage
    1217
  • Lastpage
    1219
  • Abstract
    Heterojunction diodes of p-GeSn/n-Ge were fabricated by solid-source molecular beam epitaxy on Ge substrates to investigate their electrical properties. Measurements of the current-voltage characteristics and their temperature and composition dependence were performed to extract the diode parameters of reverse saturation current, ideality factor, series resistance, and shunt resistance. The diodes showed good rectifying behavior with low turn-ON voltages in forward bias. The reverse saturation current increased with increasing Sn content and increasing temperature, and the magnitude of the breakdown voltage decreased with increasing temperature. These results suggest that Ge-Sn diodes may be useful for Ge-based circuits and optoelectronics.
  • Keywords
    elemental semiconductors; germanium; germanium alloys; molecular beam epitaxial growth; p-n heterojunctions; semiconductor diodes; tin alloys; Ge; Ge substrates; GeSn; breakdown voltage; current-voltage characteristics; diode parameters; heterojunction diodes; ideality factor; reverse saturation current; series resistance; shunt resistance; solid-source molecular beam epitaxy; Doping; Heterojunctions; P-i-n diodes; Photonic band gap; Temperature; Temperature measurement; Tin; Germanium (Ge); germanium-tin (Ge-Sn); heterojunction diodes; tin (Sn);
  • fLanguage
    English
  • Journal_Title
    Electron Device Letters, IEEE
  • Publisher
    ieee
  • ISSN
    0741-3106
  • Type

    jour

  • DOI
    10.1109/LED.2013.2278371
  • Filename
    6588937