• DocumentCode
    1102752
  • Title

    Modeling heavy implants in amorphous substrates

  • Author

    Cerofolini, Gianfranco F. ; Meda, Laura ; Polignano, M.L. ; Queirolo, Giuseppe

  • Author_Institution
    SGS-Microelectronica S.p.A, Milan, Italy
  • Volume
    32
  • Issue
    11
  • fYear
    1985
  • fDate
    11/1/1985 12:00:00 AM
  • Firstpage
    2495
  • Lastpage
    2502
  • Abstract
    A model to calculate implanted profiles for implants at fluences higher than 1015cm-2is proposed. Such a model takes into account sputtering, self-sputtering, and change of stopping power. The consideration of one parameter more than the ones of the original Lindhard-Scharff-Schiøtt theory leads to significant deviations from the original picture.
  • Keywords
    Amorphous materials; Atomic layer deposition; Implants; Power generation economics; Semiconductor process modeling; Silicon on insulator technology; Sputtering; Temperature;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/T-ED.1985.22301
  • Filename
    1485047
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=1102752