• DocumentCode
    1102819
  • Title

    Short-channel effects in subquarter-micrometer-gate HEMTs: simulation and experiment

  • Author

    Awano, Yuji ; Kosugi, Makoto ; Kosemura, Kinjiro ; Mimura, Takashi ; Abe, Masayuki

  • Author_Institution
    Fujitsu Lab. Ltd., Atsugi, Japan
  • Volume
    36
  • Issue
    10
  • fYear
    1989
  • fDate
    10/1/1989 12:00:00 AM
  • Firstpage
    2260
  • Lastpage
    2266
  • Abstract
    The authors studied the electrical properties of subquarter-micrometer-gate HEMTs (high electron mobility transistors) by Monte Carlo simulation and experiment. Simulation shows that subquarter-micrometer-gate HEMTs have extremely high performance, and the near-ballistic movement under the gate was confirmed. It is also shown that the aspect ratio of the channel could be used as a guide to determine the extent of short-channel effects. The transverse-domain formation inherent in short-channel HEMTs may also contribute to the smaller short-channel effect by limiting undesirable substrate current. Experimentally, only a negligible short-channel effect was observed when the gate length was reduced from 1.25 to 0.14 μm. Thus it is not necessary to design and fabricate a special structure for HEMTs, as such a structure might have limited applications
  • Keywords
    Monte Carlo methods; high electron mobility transistors; semiconductor device models; 0.14 to 1.25 micron; HEMTs; Monte Carlo simulation; aspect ratio; electrical properties; gate length; high electron mobility transistors; near-ballistic movement; short-channel effects; substrate current; transverse-domain formation; Circuit simulation; Electrons; FETs; Fabrication; Gallium arsenide; HEMTs; Length measurement; MESFETs; MODFETs; Threshold voltage;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/16.40908
  • Filename
    40908