A wafer manipulator for Si-molecular beam epitaxy totally based on magnetic bearings

Author

Butz, R. ; Boden, K. ; Briell, W. ; Raebiger, J. ; Rubner, W.

Author_Institution

Inst. for Thin Film & Ion Technol., Juelich Res. Centre, Germany

Volume

32

Issue

4

fYear

1996

fDate

7/1/1996 12:00:00 AM

Firstpage

2675

Lastpage

2678

Abstract

Low defect processing is a generally accepted goal to meet the performance and yield demands of future integrated circuit devices. This goal includes virtually complete elimination of any contamination. Therefore the requirement for tools and functional components is to avoid any sliding friction as an essential source of the troublesome effects. On the basis of electro-permanent magnetic bearing techniques a contactless and consequently frictionless manipulator has been developed and applied to a wafer manipulator for Si molecular beam epitaxy

Keywords

circuit optimisation; elemental semiconductors; industrial manipulators; integrated circuit yield; molecular beam epitaxial growth; process control; semiconductor epitaxial layers; semiconductor growth; silicon; Si; contamination elimination; electro-permanent magnetic bearing techniques; frictionless manipulator; low defect processing; magnetic bearings; molecular beam epitaxy; sliding friction; wafer manipulator; yield demands; Ball bearings; Contamination; Epitaxial growth; Gears; Magnetic flux; Magnetic levitation; Molecular beam epitaxial growth; Optical pumping; Vacuum systems; Wheels;

fLanguage

English

Journal_Title

Magnetics, IEEE Transactions on

Publisher

ieee

ISSN

0018-9464

Type

jour

DOI

10.1109/20.511425

Filename

511425