10 GHz surface impedance measurements of (Y,Er)BaCuO films produced by MOCVD, laser ablation, and sputtering

Author

Luine, J. ; Daly, K. ; Hu, R. ; Kain, A. ; Lee, A. ; Manasevit, H. ; Pettiette-Hall, C. ; Simon, R. ; St.John, D. ; Wagner, M.

Author_Institution

TRW Space & Technol. Group, Redondo Beach, CA, USA

Volume

27

Issue

2

fYear

1991

fDate

3/1/1991 12:00:00 AM

Firstpage

1528

Lastpage

1531

Abstract

A parallel-plate resonator technique previously used to measure microwave surface resistance R_s(T) has been extended to measure absolute penetration depth λ(T). Measurements of both quantities near 10 GHz from 4.2 K to T_c are reported for ErBaCuO thin films produced by metalorganic chemical vapor deposition (MOCVD) and for YBaCuO thin films produced by laser ablation and single-target off-axis sputtering. Each production method gives rise to films whose surface resistance is below 1 mΩ at temperatures below 40 K. The low-temperature penetration depths range from 250 nm for the laser ablation and sputtered films to 800 nm for the MOCVD films. The penetration depths in all cases increase with temperature according to the Gorter-Casimir temperature dependence

Keywords

CVD coatings; barium compounds; erbium compounds; high-temperature superconductors; penetration depth (superconductivity); superconducting thin films; surface conductivity; vapour deposited coatings; yttrium compounds; 10 GHz; 250 nm; 4.2 to 90 K; 800 nm; ErBaCuO; Gorter-Casimir temperature dependence; MOCVD; YBaCuO; absolute penetration depth; high temperature superconductor; laser ablation; microwave surface resistance; parallel-plate resonator technique; single-target off-axis sputtering; sputtering; thin films; Chemical lasers; Electrical resistance measurement; Impedance measurement; Laser ablation; MOCVD; Microwave measurements; Microwave theory and techniques; Sputtering; Surface resistance; Temperature dependence;

fLanguage

English

Journal_Title

Magnetics, IEEE Transactions on

Publisher

ieee

ISSN

0018-9464

Type

jour

DOI

10.1109/20.133474

Filename

133474